Search results for "ION BOMBARDMENT"

showing 2 items of 2 documents

Depth profiles of aggregate centers and nanodefects in LiF crystals irradiated with 34 MeV 84Kr, 56 MeV 40Ar and 12 MeV 12C ions

2018

I. Manika, J. Maniks and R. Zabels acknowledge the national project IMIS2. A. Dauletbekova, A. Akilbekov, M. Zdorovets and A. Seitbayev acknowledge the GF AP05134257of Ministry of Education and Science the Republic of Kazakhstan.

IONSMaterials sciencePhotoluminescenceF2 AND F3^+ CENTERSDislocationsAGGREGATESFLUORINE COMPOUNDS02 engineering and technologyETCHING7. Clean energy01 natural sciencesFluenceENERGY DISSIPATIONIonIRRADIATION EXPERIMENTSLIF CRYSTALION BOMBARDMENT0103 physical sciencesF2 and F3 + centersMaterials Chemistry:NATURAL SCIENCES:Physics [Research Subject Categories]IrradiationLUMINESCENCE INTENSITYPhotoluminescenceLITHIUM COMPOUNDS010302 applied physicsLiF crystalsNANOHARDNESSDISLOCATIONS (CRYSTALS)Surfaces and InterfacesGeneral ChemistryNanoindentation021001 nanoscience & nanotechnologyCondensed Matter PhysicsIsotropic etchingSurfaces Coatings and FilmsLASER SCANNING CONFOCAL MICROSCOPYNANOINDENTATION TECHNIQUESIon irradiationCOLOR CENTERSHardeningELECTRONIC ENERGY LOSSAtomic physicsDislocationLUMINESCENCE SIGNALS0210 nano-technologyLuminescenceDamage depth profiles
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Couches minces d'oxynitrure de titane : la réactivité comme moyen original de caractérisation physico - chimique

2002

Titanium oxinitride thin films, TiNxOy, were elaborated on Si(100) by the MOCVD (Metal Organic Chemical Vapor Deposition) method, using titanium isopropoxide Ti(OCH(CH3)2)4 and ammonia NH3 as precursors. By varying the growth temperature, it is possible to modify the N/O ratio and change the conductivity of the films.The target of this work was to determine the composition and the structure of these TiNxOy thin films in order to understand the electrical properties. However, this study was difficult because classical characterization techniques (SEM, XRD, Raman, XPS...) were unable to describe the whole TiNxOy system. Indeed, only a structure which is isomorphic to TiN (NaCl structure) was …

ion bombardment[CHIM.MATE] Chemical Sciences/Material chemistryanalyse factoriellecouches mincesfactor analysisTiNxOypropriétés électriquesreactivitythin filmsbombardement ionique[ CHIM.MATE ] Chemical Sciences/Material chemistryelectrical propertiesXPSréactivité
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